Fabrication of

We present the fabrication process of straight-ridge co-doped waveguides. Thin films are synthesized on silica-on-silicon wafers by middle frequency sputtering (MFS) and microwave ECR (MW-ECR) plasma source deposition. Waveguides are developed by reactive plasma etching employing gas. Photoluminesce...

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Bibliographic Details
Main Authors: Song, Qi, Gao, Jin-Song, Wang, Xiao-Yi, Chen, Hong, Zheng, Xuan-Ming, Wang, Tong-Tong, Li, Cheng-Ren, Song, Chang-Lie
Format: Conference Proceeding
Language:English
Subjects:
dry etching
erbium
optical amplifiers
optical gain
Online Access:Get full text
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Summary:We present the fabrication process of straight-ridge co-doped waveguides. Thin films are synthesized on silica-on-silicon wafers by middle frequency sputtering (MFS) and microwave ECR (MW-ECR) plasma source deposition. Waveguides are developed by reactive plasma etching employing gas. Photoluminescence (PL) spectrum and gain measurements at are investigated at room temperature: a net gain of is achieved from a -long waveguide obtained by MFS, and is achieved from a MW-ECR with a pump power of .
ISSN:0091-3286
1560-2303
DOI:10.1117/1.2721529