Chemical vapor deposited graphene: From synthesis to applications

• Published in: Physica status solidi. A, Applications and materials science Applications and materials science, 2014-11, Vol.211 (11), p.2439-2449
• Main Authors: Kataria, S., Wagner, S., Ruhkopf, J., Gahoi, A., Pandey, H., Bornemann, R., Vaziri, S., Smith, A. D., Ostling, M., Lemme, M. C.
• Format: Article
• Language: English
• Subjects: Chemical vapor deposition; Compatibility; Graphene; graphene transfer; hot electron transistor; pressure sensor; Production methods; Semiconductors; Synthesis; Synthesis (chemistry); Two dimensional
• ISSN: 1862-6300; 1862-6319; 1862-6319
• DOI: 10.1002/pssa.201400049

Graphene is a material with enormous potential for numerous applications. Therefore, significant efforts are dedicated to large‐scale graphene production using a chemical vapor deposition (CVD) technique. In addition, research is directed at developing methods to incorporate graphene in established production technologies and process flows. In this paper, we present a brief review of available CVD methods for graphene synthesis. We also discuss scalable methods to transfer graphene onto desired substrates. Finally, we discuss potential applications that would benefit from a fully scaled, semiconductor technology compatible production process. Graphene, the queen of two‐dimensional materials, is a wonder material for researchers owing to its astonishing properties and number of applications. The main hurdles for utilizing graphene have been its large‐area synthesis and successful transfer to desired substrates. In this review, the authors try to highlight CVD synthesis methods of graphene, large‐area transfer methods and several potential applications of graphene.