Atomic-layer deposited thulium oxide as a passivation layer on germanium

• Published in: Journal of applied physics 2015-06, Vol.117 (21)
• Main Authors: Mitrovic, I. Z., Hall, S., Althobaiti, M., Hesp, D., Dhanak, V. R., Santoni, A., Weerakkody, A. D., Sedghi, N., Chalker, P. R., Henkel, C., Dentoni Litta, E., Hellström, P.-E., Östling, M., Tan, H., Schamm-Chardon, S.
• Format: Article
• Language: English
• Subjects: Applied physics; Atomic layer deposition; Condensed Matter; CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; DEPOSITION; ELECTRON DIFFRACTION; Electron energy; Electron energy levels; Electron energy loss spectroscopy; Electron scattering; ELECTRONS; ELLIPSOMETRY; Energy dissipation; Energy gap; Energy transmission; ENERGY-LOSS SPECTROSCOPY; EV RANGE; GERMANIUM; GERMANIUM OXIDES; High resolution transmission electron microscopy; HOLES; INTERFACES; LAYERS; Materials Science; OXIDATION; PASSIVATION; Physics; POLYCRYSTALS; Spectroellipsometry; Spectroscopic ellipsometry; Spectrum analysis; Stacks; Thickness; Thulium; THULIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; VALENCE; Valence band; X ray photoelectron spectroscopy; X ray spectra
• ISSN: 0021-8979; 1089-7550; 1089-7550
• DOI: 10.1063/1.4922121

A comprehensive study of atomic-layer deposited thulium oxide (Tm2O3) on germanium has been conducted using x-ray photoelectron spectroscopy (XPS), vacuum ultra-violet variable angle spectroscopic ellipsometry, high-resolution transmission electron microscopy (HRTEM), and electron energy-loss spectroscopy. The valence band offset is found to be 3.05 ± 0.2 eV for Tm2O3/p-Ge from the Tm 4d centroid and Ge 3p3/2 charge-corrected XPS core-level spectra taken at different sputtering times of a single bulk thulium oxide sample. A negligible downward band bending of ∼0.12 eV is observed during progressive differential charging of Tm 4d peaks. The optical band gap is estimated from the absorption edge and found to be 5.77 eV with an apparent Urbach tail signifying band gap tailing at ∼5.3 eV. The latter has been correlated to HRTEM and electron diffraction results corroborating the polycrystalline nature of the Tm2O3 films. The Tm2O3/Ge interface is found to be rather atomically abrupt with sub-nanometer thickness. In addition, the band line-up of reference GeO2/n-Ge stacks obtained by thermal oxidation has been discussed and derived. The observed low reactivity of thulium oxide on germanium as well as the high effective barriers for holes (∼3 eV) and electrons (∼2 eV) identify Tm2O3 as a strong contender for interfacial layer engineering in future generations of scaled high-κ gate stacks on Ge.