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Structure and properties of phosphorus-carbide thin solid films
Phosphorus-carbide (CPx) thin solid films have been deposited by unbalanced reactive magnetron sputtering from a compound C-P target and investigated by transmission electron microscopy, X-ray photoelectron spectroscopy, scanning electron microscopy, elastic recoil detection analysis, Raman scatteri...
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Published in: | Thin solid films 2013-12, Vol.548 (2), p.247-254 |
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Main Authors: | , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Phosphorus-carbide (CPx) thin solid films have been deposited by unbalanced reactive magnetron sputtering from a compound C-P target and investigated by transmission electron microscopy, X-ray photoelectron spectroscopy, scanning electron microscopy, elastic recoil detection analysis, Raman scattering spectroscopy, nanoindentation, and four-point electrical probe techniques. CPx films with x=0.1 deposited at 300°C exhibit a structure with elements of short-range ordering in the form of curved and inter-locked fullerene-like fragments. The films have a hardness of 34.4GPa, elastic recovery of 72% and surface roughness of 0.5nm. Higher deposition temperatures yield CPx films with an increasingly amorphous structure, and reduced hardness.
•Phosphorus-carbide (CPx) thin solid films have been deposited by magnetron sputtering.•Structural and chemical bonding properties were investigated.•CPx thin solid films show high mechanical resiliency.•Low temperature favors fullerene-like structural properties. |
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ISSN: | 0040-6090 1879-2731 1879-2731 |
DOI: | 10.1016/j.tsf.2013.10.010 |