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Structure and properties of phosphorus-carbide thin solid films

Phosphorus-carbide (CPx) thin solid films have been deposited by unbalanced reactive magnetron sputtering from a compound C-P target and investigated by transmission electron microscopy, X-ray photoelectron spectroscopy, scanning electron microscopy, elastic recoil detection analysis, Raman scatteri...

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Bibliographic Details
Published in:Thin solid films 2013-12, Vol.548 (2), p.247-254
Main Authors: Furlan, A., Gueorguiev, G.K., Czigány, Zs, Darakchieva, V., Braun, S., Correia, M.R., Högberg, H., Hultman, L.
Format: Article
Language:English
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Summary:Phosphorus-carbide (CPx) thin solid films have been deposited by unbalanced reactive magnetron sputtering from a compound C-P target and investigated by transmission electron microscopy, X-ray photoelectron spectroscopy, scanning electron microscopy, elastic recoil detection analysis, Raman scattering spectroscopy, nanoindentation, and four-point electrical probe techniques. CPx films with x=0.1 deposited at 300°C exhibit a structure with elements of short-range ordering in the form of curved and inter-locked fullerene-like fragments. The films have a hardness of 34.4GPa, elastic recovery of 72% and surface roughness of 0.5nm. Higher deposition temperatures yield CPx films with an increasingly amorphous structure, and reduced hardness. •Phosphorus-carbide (CPx) thin solid films have been deposited by magnetron sputtering.•Structural and chemical bonding properties were investigated.•CPx thin solid films show high mechanical resiliency.•Low temperature favors fullerene-like structural properties.
ISSN:0040-6090
1879-2731
1879-2731
DOI:10.1016/j.tsf.2013.10.010