Free electron properties and hydrogen in InN grown by MOVPE

In this work we present a comprehensive study on the hydrogen impurities, free electron, and structural properties of MOVPE InN films with state‐of‐the‐art quality. We find a correlation between the decrease of free electron concentration and the reduction of bulk hydrogen in the films upon thermal...

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Bibliographic Details
Published in:Physica Status Solidi A (applications and materials science) 2011-05, Vol.208 (5), p.1179-1182
Main Authors: Darakchieva, V., Xie, M.-Y., Rogalla, D., Becker, H.-W., Lorenz, K., Alves, E., Ruffenach, S., Moret, M., Briot, O.
Format: Article
Language:English
Subjects:
Condensed Matter
free electron properties
hydrogen
InN
Materials Science
Physics
TECHNOLOGY
TEKNIKVETENSKAP
unintentional doping
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Summary:In this work we present a comprehensive study on the hydrogen impurities, free electron, and structural properties of MOVPE InN films with state‐of‐the‐art quality. We find a correlation between the decrease of free electron concentration and the reduction of bulk hydrogen in the films upon thermal annealing, while no changes in the dislocation densities and strain are observed. Our results suggest that hydrogen is a major source for the unintentional n‐type doping in MOVPE InN.
ISSN:1862-6300
1862-6319
DOI:10.1002/pssa.201001151