Fabrication of sub-micron high aspect ratio diamond structures with nanoimprint lithography

• Published in: Microelectronic engineering 2010-11, Vol.87 (11), p.2077-2080
• Main Authors: Karlsson, M., Vartianen, I., Kuittinen, M., Nikolajeff, F.
• Format: Article
• Language: English
• Subjects: Applied sciences; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Cross-disciplinary physics: materials science; rheology; CVD diamond; Diffraction gratings; Electronics; Etching; Exact sciences and technology; Gratings (spectra); Inductively coupled plasma etching; Lithography; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Methods of nanofabrication; Microelectronic fabrication (materials and surfaces technology); Nanocomposites; Nanoimprint lithography; Nanomaterials; Nanoscale pattern formation; Nanostructure; Nanostructures; Physics; Polycrystalline diamond; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Surface treatments; TECHNOLOGY; TEKNIKVETENSKAP
• ISSN: 0167-9317; 1873-5568; 1873-5568
• DOI: 10.1016/j.mee.2009.12.085

Polycrystalline diamond with optical quality has been patterned using nanoimprint lithography. Nanoimprint lithography is a rather new method for fabrication of resist structures with features sizes down to at least 20 nm. The pattern used in this article is a grating with a period of 600 nm and a fill factor of 0.5. Using plasma etching the nanoimprinted grating is etched into a freestanding diamond substrate. We have accomplished the fabrication of 300 nm diamond features with a depth of about 2 μm, which corresponds to an aspect ratio of 7.