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Photocatalytic activity of TiO2 deposited by reactive HiPIMS with long target-to-substrate distance
Reactive High Power Impulse Magnetron Sputtering (HiPIMS) of TiO2 thin films was carried out to investigate the influence of ion parameters and the deposition temperature on the film crystallinity and photocatalytic performance. In order to limit unintentional substrate heating, a deposition setup w...
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Published in: | Surface & coatings technology 2023-08, Vol.467, p.129659, Article 129659 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Reactive High Power Impulse Magnetron Sputtering (HiPIMS) of TiO2 thin films was carried out to investigate the influence of ion parameters and the deposition temperature on the film crystallinity and photocatalytic performance. In order to limit unintentional substrate heating, a deposition setup with long target-to-substrate distance was used. Different HiPIMS pulse configurations, deposition temperatures and substrate bias were evaluated. TiO2 films prepared by pulsed dc magnetron sputtering were used as reference. Films deposited at room temperature were all found to be X-ray amorphous, and a minimum temperature of 200 °C was needed for film crystallization irrespective of the mode of operation. This is attributed to the relatively long target-to-substrate distance of 180 mm used in this work. The growth of a specific polymorph was shown to be dependent on the operation mode, where a high oxygen partial pressure was ideal for anatase formation. The photodegradation rates were, as expected, found to be highest for crystalline samples, where single- and mixed-phase films yielded similar rates. Furthermore, the photodegradation rates of HiPIMS films deposited without substrate heating could be enhanced up to 3 times as compared to the corresponding pulsed dc reference film. The ion assistance in HiPIMS is also beneficial at moderate temperatures, here 200 °C, where an improved crystallinity as compared to pdcMS, was observed.
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•TiO2 deposited by reactive HiPIMS and pdcMS with long target-to-substrate distance•The effect of substrate temperature, bias, and peak power density investigated•All films deposited without substrate heating were X-ray amorphous•Enhanced photocatalytic activity of HiPIMS films grown without heating confirmed |
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ISSN: | 0257-8972 1879-3347 1879-3347 |
DOI: | 10.1016/j.surfcoat.2023.129659 |