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Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films

Fluorinated amorphous carbon (a-CFx) films were studied by high-resolution x-ray absorption, emission, and photoelectron spectroscopy. The composition and local bonding information were obtained and correlated with substrate temperature during deposition. The data suggest that the structure of the a...

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Published in:Applied physics letters 1998-06, Vol.72 (25), p.3353-3355
Main Authors: Ma, Yanjun, Yang, Hongning, Guo, J., Sathe, C., Agui, A., Nordgren, J.
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Language:English
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cited_by cdi_FETCH-LOGICAL-c327t-71c65a810983004602b8a18f7fb20f33d625245d47e32a8f4a0bb775172292c93
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container_issue 25
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container_title Applied physics letters
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description Fluorinated amorphous carbon (a-CFx) films were studied by high-resolution x-ray absorption, emission, and photoelectron spectroscopy. The composition and local bonding information were obtained and correlated with substrate temperature during deposition. The data suggest that the structure of the a-CFx is mostly of carbon rings connected by CF2 groups. The cross linking increases with substrate temperature.
doi_str_mv 10.1063/1.121601
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ispartof Applied physics letters, 1998-06, Vol.72 (25), p.3353-3355
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source AIP - American Institute of Physics; AIP Digital Archive
subjects DIAMOND
title Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films
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