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Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films
Fluorinated amorphous carbon (a-CFx) films were studied by high-resolution x-ray absorption, emission, and photoelectron spectroscopy. The composition and local bonding information were obtained and correlated with substrate temperature during deposition. The data suggest that the structure of the a...
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Published in: | Applied physics letters 1998-06, Vol.72 (25), p.3353-3355 |
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cited_by | cdi_FETCH-LOGICAL-c327t-71c65a810983004602b8a18f7fb20f33d625245d47e32a8f4a0bb775172292c93 |
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container_end_page | 3355 |
container_issue | 25 |
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container_title | Applied physics letters |
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creator | Ma, Yanjun Yang, Hongning Guo, J. Sathe, C. Agui, A. Nordgren, J. |
description | Fluorinated amorphous carbon (a-CFx) films were studied by high-resolution x-ray absorption, emission, and photoelectron spectroscopy. The composition and local bonding information were obtained and correlated with substrate temperature during deposition. The data suggest that the structure of the a-CFx is mostly of carbon rings connected by CF2 groups. The cross linking increases with substrate temperature. |
doi_str_mv | 10.1063/1.121601 |
format | article |
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ispartof | Applied physics letters, 1998-06, Vol.72 (25), p.3353-3355 |
issn | 0003-6951 1077-3118 |
language | eng |
recordid | cdi_swepub_primary_oai_DiVA_org_uu_70667 |
source | AIP - American Institute of Physics; AIP Digital Archive |
subjects | DIAMOND |
title | Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films |
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