New microwave and hollow cathode hybrid plasma sources

• Published in: Surface & coatings technology 2004, Vol.177, p.651-656
• Main Authors: Bárdoš, L., Baránková, H., Gustavsson, L.E., Teer, D.G.
• Format: Article
• Language: English
• Subjects: Electron cyclotron resonance; Hollow cathode; Low-pressure hybrid plasma source; Radio frequency
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/j.surfcoat.2003.08.059

New hybrid plasma sources for both low gas pressure processing (below 1 Pa) and for generation of cold atmospheric plasma are introduced. The sources combine advantages of the microwave plasma with the hollow cathode plasma in a common system. The low-pressure hybrid plasma source (HYP LP) combines the ECR (electron cyclotron resonance) plasma inside microwave radiator and the radio frequency (RF) hollow cathode plasma generated by linear magnetized hollow cathode at the outlet of the radiator. The plasmas are coupled together in a common magnetic field facilitating both the hollow cathode plasma and the ECR absorption of the microwave power in the vicinity of the cathode outlet. The plasma density 15 cm below the source outlet reaches 6×10 11 cm −3 at 1 kW incident power from both generators and argon pressure of 0.8 Pa. This classifies the HYP LP source as a high-density plasma source. The TiN film deposition rate of approximately 150 nm/min was achieved in the reactive PVD of highly (111) textured TiN films. The atmospheric pressure hybrid plasma source (HYP AP) combines a microwave antenna and a RF hollow cathode in a common electrode. The source is able to produce long atmospheric plasma plumes and to control plasma parameters efficiently. The HYP sources have a full ambition to become new powerful processing tools on the market.