Antimicrobial activity of hydroxyl radicals generated by hydrogen peroxide photolysis against Streptococcus mutans biofilm

Highlights • Streptococcus mutans biofilm became up to 200 µm thick after 24 h of incubation. • S. mutans biofilm grown for over 6 h acquired antibiotic resistance. • Hydroxyl radicals generated by H2 O2 photolysis could kill bacteria in biofilm. • H2 O2 photolysis was effective both against biofilm...

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Bibliographic Details
Published in:International journal of antimicrobial agents 2016-10, Vol.48 (4), p.373-380
Main Authors: Nakamura, Keisuke, Shirato, Midori, Kanno, Taro, Örtengren, Ulf, Lingström, Peter, Niwano, Yoshimi
Format: Article
Language:English
Subjects:
Anti-Infective Agents, Local - pharmacology
Biofilm
Biofilms - drug effects
Colony Count, Microbial
Confocal laser scanning microscopy
Dentistry
DISINFECTION SYSTEM
Hydrogen peroxide
Hydrogen Peroxide - metabolism
Hydroxyl radical
Hydroxyl Radical - pharmacology
Infectious Disease
MICROBIAL BIOFILMS
Microbial Viability - drug effects
Microscopy, Confocal
Odontologi
Photolysis
RESISTANCE
Streptococcus mutans
Streptococcus mutans - drug effects
Streptococcus mutans - physiology
SUSCEPTIBILITY
SYSTEM UTILIZING PHOTOLYSIS
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Summary:Highlights • Streptococcus mutans biofilm became up to 200 µm thick after 24 h of incubation. • S. mutans biofilm grown for over 6 h acquired antibiotic resistance. • Hydroxyl radicals generated by H2 O2 photolysis could kill bacteria in biofilm. • H2 O2 photolysis was effective both against biofilm and planktonic bacteria.
ISSN:0924-8579
1872-7913
DOI:10.1016/j.ijantimicag.2016.06.007