High temperature deposition of SiO2 on hot wires by decomposition of tetraethoxysilane

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1994-02, Vol.141 (2), p.514-518
Main Authors: TILLER, H.-J, WIENKE, J, MEYER, J
Format: Article
Language:English
Subjects:
Biofysica
Biophysics
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Ion and electron beam-assisted deposition
ion plating
Laboratorium voor Biofysica
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2054757