Instrumentation and application of the ion beam analysis line of the in situ ion beam system

An ion beam analysis system was established on a 1.7 MV tandem accelerator, enabling Rutherford backscat- tering （RBS）, elastic recoil detection （ERD）, nuclear reaction analysis （NRA） and channeling measurements. The system was tested by performing qualitative and quantitative analysis of Si, Ni/Si,...

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Bibliographic Details
Published in:核技术（英文版） 2015-02, Vol.26 (1), p.19-24
Main Author: HUANG Zhi-Hong ZHANG Zao-Di WANG Ze-Song WANG Lang-Ping FU De-Jun
Format: Article
Language:English
Subjects:
BiFeO3
Si（100）
仪器
分析线
原位
应用程序
弹性反冲探测
离子束系统
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Summary:An ion beam analysis system was established on a 1.7 MV tandem accelerator, enabling Rutherford backscat- tering （RBS）, elastic recoil detection （ERD）, nuclear reaction analysis （NRA） and channeling measurements. The system was tested by performing qualitative and quantitative analysis of Si, Ni/Si, BiFeO3 ：La/Si, MoC/Mo/Si and TiBN/Si samples. RBS of a BiFeO3：La film was used as system calibration. Tested by ion beam channeling, a Si（100） is of good crystallinity （Xmin = 3.01%）. For thin film samples, the measured thick- ness agrees well with simulation results by SIMNRA. In particular, composition of a MoC/Mo/Si and TiBN film samples were analyzed by RBS and non-Rutherford elastic backscattering.
ISSN:1001-8042
2210-3147
DOI:10.13538/j.1001-8042/nst.26.010202