Optical Properties and Microstructure of Ta2O5 Thin Films Prepared by Ion Assisted Electron Beam Evaporation

An effective method for determining the refractive index of weak absorption transparent thin films was presented, which is also applicable to other weak absorption dielectric thin films. The as-deposited Ta2O5 thin films prepared by ion assisted electron beam evaporation showed a maxima transmittanc...

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Bibliographic Details
Published in:Journal of Wuhan University of Technology. Materials science edition 2008-10, Vol.23 (5), p.632-637
Main Authors: Zhang, Guangyong, Xue, Yiyu, Guo, Peitao, Wang, Hanhua, Ma, Zhongjie
Format: Article
Language:English
Subjects:
Atoms & subatomic particles
Chemistry and Materials Science
Materials Science
Microstructure
R&D
Research & development
Thin films
五氧化二钽薄膜
光学性质
制备方法
微观结构
电子束放射
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Summary:An effective method for determining the refractive index of weak absorption transparent thin films was presented, which is also applicable to other weak absorption dielectric thin films. The as-deposited Ta2O5 thin films prepared by ion assisted electron beam evaporation showed a maxima transmittance as high as 93% which was close to that of the bare substrate, and exhibited a blue shift when the substrate temperature increased from room temperature to 250 ℃. The refractive index seemed to be immune to the substrate temperature and film thickness with its value about 2.14 at incidence wavelength of 55（1 nm. The surface morphology measured by atomic force microscopy （AFM） revealed that the microstructures lead to the slim optical difference, which was the interplay of substrate temperature and assisted ion beam.
ISSN:1000-2413
1993-0437
DOI:10.1007/s11595-007-5632-y