Effect of fabrication parameters on the microstructure,in-plane anisotropy and magnetostriction of Fe-Ga thin films

• Published in: Rare metals 2010-12, Vol.29 (6), p.583-588
• Main Authors: Wang, Bowen, Huang, Wenmei, Cao, Shuying, Du, Yong, He, Yuehui, Huang, Baiyun
• Format: Article
• Language: English
• Subjects: Anisotropy; Biomaterials; Chemistry and Materials Science; Coercive force; Coercivity; Energy; Iron; Magnetic properties; Magnetostriction; Materials Engineering; Materials Science; Metallic Materials; Microstructure; Nanoscale Science and Technology; Physical Chemistry; Sputtering; Thin films; X射线衍射分析; 平面各向异性; 微观结构; 振动样品磁强计; 超磁致伸缩换能器
• ISSN: 1001-0521; 1867-7185
• DOI: 10.1007/s12598-010-0174-4

The microstructure,in-plane anisotropy,and magnetic properties of Fe-Ga thin films were investigated by X-ray diffraction analysis,vibrating sample magnetometer,and capacitive cantilever method.The in-plane induced anisotropy is well formed by the applied magnetic field during sputtering,and the anisotropy field Hk decreases with the sputtering power increasing.The coercivity of Fe-Ga thin films decreases with increasing power when the sputtering power is less than 60 W and increases when the power is larger than 60 W.The magnetostriction of the thin films reaches 66 × 10-6 at the sputtering power of 60 W.Excellent Fe-Ga films,which exhibit good field sensitivity,low coercivity and high magnetostriction,have been fabricated at the power of 60 W,and they can be used as the materials of magnetostrictive transducers.