Hydrogen Evolution Reaction: Wafer‐Scale and Low‐Temperature Growth of 1T‐WS2 Film for Efficient and Stable Hydrogen Evolution Reaction (Small 6/2020)

In article number 1905000, Jae‐Hyun Lee, Taesung Kim, and co‐workers demonstrate a uniform and stable 1T phase of WS2 (1T‐WS2) film on 4‐inch wafer using a plasma‐enhanced chemical vapor deposition system. The nanocrystalline 1T‐WS2, containing high density of grain boundary, is utilized as an elect...

Full description

Saved in:
Bibliographic Details
Published in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2020-02, Vol.16 (6), p.n/a
Main Authors: Kim, Hyeong‐U, Kanade, Vinit, Kim, Mansu, Kim, Ki Seok, An, Byeong‐Seon, Seok, Hyunho, Yoo, Hocheon, Chaney, Lindsay E., Kim, Seung‐Il, Yang, Cheol‐Woong, Yeom, Geun Yong, Whang, Dongmok, Lee, Jae‐Hyun, Kim, Taesung
Format: Article
Language:English
Subjects:
1T‐WS2
2D materials
electrocatalysts
hydrogen evolution reaction
plasma‐enhanced chemical vapor deposition
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:In article number 1905000, Jae‐Hyun Lee, Taesung Kim, and co‐workers demonstrate a uniform and stable 1T phase of WS2 (1T‐WS2) film on 4‐inch wafer using a plasma‐enhanced chemical vapor deposition system. The nanocrystalline 1T‐WS2, containing high density of grain boundary, is utilized as an electrocatalyst for the hydrogen evolution reaction and exhibits efficient catalytic activity and high durability.
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.202070033