Hydrogen Evolution Reaction: Wafer‐Scale and Low‐Temperature Growth of 1T‐WS2 Film for Efficient and Stable Hydrogen Evolution Reaction (Small 6/2020)

In article number 1905000, Jae‐Hyun Lee, Taesung Kim, and co‐workers demonstrate a uniform and stable 1T phase of WS2 (1T‐WS2) film on 4‐inch wafer using a plasma‐enhanced chemical vapor deposition system. The nanocrystalline 1T‐WS2, containing high density of grain boundary, is utilized as an elect...

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Published in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2020-02, Vol.16 (6), p.n/a
Main Authors: Kim, Hyeong‐U, Kanade, Vinit, Kim, Mansu, Kim, Ki Seok, An, Byeong‐Seon, Seok, Hyunho, Yoo, Hocheon, Chaney, Lindsay E., Kim, Seung‐Il, Yang, Cheol‐Woong, Yeom, Geun Yong, Whang, Dongmok, Lee, Jae‐Hyun, Kim, Taesung
Format: Article
Language:English
Subjects:
1T‐WS2
2D materials
electrocatalysts
hydrogen evolution reaction
plasma‐enhanced chemical vapor deposition
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container_issue 6
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container_title Small (Weinheim an der Bergstrasse, Germany)
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creator Kim, Hyeong‐U
Kanade, Vinit
Kim, Mansu
Kim, Ki Seok
An, Byeong‐Seon
Seok, Hyunho
Yoo, Hocheon
Chaney, Lindsay E.
Kim, Seung‐Il
Yang, Cheol‐Woong
Yeom, Geun Yong
Whang, Dongmok
Lee, Jae‐Hyun
Kim, Taesung
description In article number 1905000, Jae‐Hyun Lee, Taesung Kim, and co‐workers demonstrate a uniform and stable 1T phase of WS2 (1T‐WS2) film on 4‐inch wafer using a plasma‐enhanced chemical vapor deposition system. The nanocrystalline 1T‐WS2, containing high density of grain boundary, is utilized as an electrocatalyst for the hydrogen evolution reaction and exhibits efficient catalytic activity and high durability.
doi_str_mv 10.1002/smll.202070033
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subjects 1T‐WS2
2D materials
electrocatalysts
hydrogen evolution reaction
plasma‐enhanced chemical vapor deposition
title Hydrogen Evolution Reaction: Wafer‐Scale and Low‐Temperature Growth of 1T‐WS2 Film for Efficient and Stable Hydrogen Evolution Reaction (Small 6/2020)
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