Supplementary information files for CFD modeling of pharmaceuticals and CECs removal by UV/H<sub>2</sub>O<sub>2</sub> process in helical microcapillary photoreactors and evaluation of OH radical rate constants

Supplementary files for article CFD modeling of pharmaceuticals and CECs removal by UV/H2O2 process in helical microcapillary photoreactors and evaluation of OH radical rate constants. Process intensification by tailored secondary flow in helical microcapillary film (MCF) photoreactors was unveiled...

Full description

Saved in:
Bibliographic Details
Main Authors: Rodrigo Peralta-Muniz-Moreira, Gianluca Li-Puma
Format: Data Data
Published: 2021
Subjects:
Chemical engineering not elsewhere classified
Advanced oxidation process
Water treatment
Photochemical peroxidation
Contaminants of emerging concern
Microreactor
Modelling
Chemical Engineering not elsewhere classified
Online Access:https://dx.doi.org/10.17028/rd.lboro.14216243.v1
Tags: Add Tag
No Tags, Be the first to tag this record!

Internet

https://dx.doi.org/10.17028/rd.lboro.14216243.v1

Similar Items