Supplementary information files for CFD modeling of pharmaceuticals and CECs removal by UV/H₂O₂ process in helical microcapillary photoreactors and evaluation of OH radical rate constants

Supplementary files for article CFD modeling of pharmaceuticals and CECs removal by UV/H2O2 process in helical microcapillary photoreactors and evaluation of OH radical rate constants. Process intensification by tailored secondary flow in helical microcapillary film (MCF) photoreactors was unveiled...

Full description

Bibliographic Details

Main Authors:	Rodrigo Peralta-Muniz-Moreira, Gianluca Li-Puma
Format:	Data Data
Published:	2021
Subjects:	Chemical engineering not elsewhere classified Advanced oxidation process Water treatment Photochemical peroxidation Contaminants of emerging concern Microreactor Modelling Chemical Engineering not elsewhere classified
Online Access:	https://dx.doi.org/10.17028/rd.lboro.14216243.v1
Tags:	Add Tag No Tags, Be the first to tag this record!