TCAD augmented generative adversarial network for hot-spot detection and mask-layout optimization in a large area HARC etching process

Cost-effective vertical etching of plug holes and word lines is crucial in enhancing 3D NAND device manufacturability. Even though multiscale technology computer-aided design (TCAD) methodology is suitable for effectively predicting etching processes and optimizing recipes, it is highly time-consumi...

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Bibliographic Details

Main Authors:	Hyoungcheol Kwon, Hyunsuk Huh, Hwiwon Seo, Songhee Han, Imhee Won, Jiwoong Sue, Dongyean Oh, Felipe Iza, Seungchul Lee, Sung Kye Park, Seonyong Cha
Format:	Default Article
Published:	2022
Subjects:	Physical sciences Classical physics Science & Technology Physical Sciences Physics, Fluids & Plasmas Physics Fluids & Plasmas
Online Access:	https://hdl.handle.net/2134/22226503.v1
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