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Use of supramolecular assemblies as lithographic resists
A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving...
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| Main Authors: | , , , , , , , , , , , , , , , |
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| Format: | Default Article |
| Published: |
2017
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| Subjects: | |
| Online Access: | https://hdl.handle.net/2134/37379 |
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| _version_ | 1818168657353637888 |
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| author | Scott M. Lewis Antonio Fernandez-Mato Guy A. DeRose Matthew S. Hunt George F. Whitehead Agnese Lagzda Hayden R. Alty Jesus Ferrando-Soria Sarah Varey Andreas K. Kostopoulos Fredrik Schedin Christopher A. Muryn Grigore A. Timco Axel Scherer Stephen G. Yeates Richard E. Winpenny |
| author_facet | Scott M. Lewis Antonio Fernandez-Mato Guy A. DeRose Matthew S. Hunt George F. Whitehead Agnese Lagzda Hayden R. Alty Jesus Ferrando-Soria Sarah Varey Andreas K. Kostopoulos Fredrik Schedin Christopher A. Muryn Grigore A. Timco Axel Scherer Stephen G. Yeates Richard E. Winpenny |
| author_sort | Scott M. Lewis (7164932) |
| collection | Figshare |
| description | A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas. |
| format | Default Article |
| id | rr-article-9393947 |
| institution | Loughborough University |
| publishDate | 2017 |
| record_format | Figshare |
| spelling | rr-article-93939472017-05-15T00:00:00Z Use of supramolecular assemblies as lithographic resists Scott M. Lewis (7164932) Antonio Fernandez-Mato (7162997) Guy A. DeRose (7164935) Matthew S. Hunt (7164938) George F. Whitehead (7163225) Agnese Lagzda (7164941) Hayden R. Alty (7164944) Jesus Ferrando-Soria (2930160) Sarah Varey (3377402) Andreas K. Kostopoulos (7163222) Fredrik Schedin (5608040) Christopher A. Muryn (1336551) Grigore A. Timco (1262340) Axel Scherer (1921930) Stephen G. Yeates (1488412) Richard E. Winpenny (7163006) Other chemical sciences not elsewhere classified Heterometallic compounds Lithography Supramolecular assembly Resist materials Chemical Sciences not elsewhere classified A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas. 2017-05-15T00:00:00Z Text Journal contribution 2134/37379 https://figshare.com/articles/journal_contribution/Use_of_supramolecular_assemblies_as_lithographic_resists/9393947 CC BY-NC-ND 4.0 |
| spellingShingle | Other chemical sciences not elsewhere classified Heterometallic compounds Lithography Supramolecular assembly Resist materials Chemical Sciences not elsewhere classified Scott M. Lewis Antonio Fernandez-Mato Guy A. DeRose Matthew S. Hunt George F. Whitehead Agnese Lagzda Hayden R. Alty Jesus Ferrando-Soria Sarah Varey Andreas K. Kostopoulos Fredrik Schedin Christopher A. Muryn Grigore A. Timco Axel Scherer Stephen G. Yeates Richard E. Winpenny Use of supramolecular assemblies as lithographic resists |
| title | Use of supramolecular assemblies as lithographic resists |
| title_full | Use of supramolecular assemblies as lithographic resists |
| title_fullStr | Use of supramolecular assemblies as lithographic resists |
| title_full_unstemmed | Use of supramolecular assemblies as lithographic resists |
| title_short | Use of supramolecular assemblies as lithographic resists |
| title_sort | use of supramolecular assemblies as lithographic resists |
| topic | Other chemical sciences not elsewhere classified Heterometallic compounds Lithography Supramolecular assembly Resist materials Chemical Sciences not elsewhere classified |
| url | https://hdl.handle.net/2134/37379 |