Use of supramolecular assemblies as lithographic resists

A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving...

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Bibliographic Details
Main Authors: Scott M. Lewis, Antonio Fernandez-Mato, Guy A. DeRose, Matthew S. Hunt, George F. Whitehead, Agnese Lagzda, Hayden R. Alty, Jesus Ferrando-Soria, Sarah Varey, Andreas K. Kostopoulos, Fredrik Schedin, Christopher A. Muryn, Grigore A. Timco, Axel Scherer, Stephen G. Yeates, Richard E. Winpenny
Format: Default Article
Published: 2017
Subjects:
Other chemical sciences not elsewhere classified
Heterometallic compounds
Lithography
Supramolecular assembly
Resist materials
Chemical Sciences not elsewhere classified
Online Access:https://hdl.handle.net/2134/37379
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https://hdl.handle.net/2134/37379

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