The influence of microstructure on the probability of early failure in aluminum-based interconnects
For electromigration in short aluminum interconnects terminated by tungsten vias, the well known “short-line” effect applies. In a similar manner, for longer lines, early failure is determined by a critical value Lcrit for the length of polygranular clusters. Any cluster shorter than Lcrit is “immor...
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| Format: | Default Article |
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2004
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| Online Access: | https://hdl.handle.net/2134/4987 |
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