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Periodic Mesoporous Organosilicas with Phenylene Bridging Groups, 1,4-(CH2) n C6H4 (n = 0−2)

Periodic mesoporous organosilicas (PMOs) were prepared by polymerizing phenylene-bridged silsesquioxane precursors containing an incremental increase in methylene spacers [1,4-(CH2) n C6H4 (n = 0−2)] in combination with polyoxyethylene(10) cetyl ether (Brij 56) oligomers as structure-directing speci...

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Bibliographic Details
Published in:Chemistry of materials 2004-12, Vol.16 (25), p.5465-5472
Main Authors: Hunks, William J, Ozin, Geoffrey A
Format: Article
Language:English
Online Access:Get full text
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Summary:Periodic mesoporous organosilicas (PMOs) were prepared by polymerizing phenylene-bridged silsesquioxane precursors containing an incremental increase in methylene spacers [1,4-(CH2) n C6H4 (n = 0−2)] in combination with polyoxyethylene(10) cetyl ether (Brij 56) oligomers as structure-directing species under acid catalysis. Surfactant templates were removed from the nanoporous inorganic−organic hybrids using acidified ethanol extractions. Mesoporous organosilicas were characterized by powder X-ray diffraction, nitrogen gas sorption, 13C and 29Si solid-state NMR, scanning and transmission electron microscopy, and thermogravimetric analysis. Organosilica materials formed uniform arrays of 2D-hexagonal mesopores with pore diameters ranging from 2 to 3 nm and corresponding surface areas of 750−1200 m2g-1. Addition of two methylene groups to the phenylene bridge resulted in a substantial decrease in the pore size, surface area, and pore volume. The thermal stability of the materials decreases in the following order:  phenylene > 4-benzyl > p-xylene. Aryl−silicon bonded networks display greater thermal stability than methylene−silica covalently bound frameworks. Decomposition of aryl−silica units occurred between 450 and 750 °C, whereas methylene−silica moieties decomposed in the range 300−600 °C. These hybrid mesoporous materials represent the first introduction of precursors with two-structural organic-bridging units as an integral part of the organosilicate-bonded matrix.
ISSN:0897-4756
1520-5002
DOI:10.1021/cm048986p