Low-energy electron interactions with chlorotrimethylsilane (Si (CH 3 ) 3 Cl), dichlorodimethylsilane (Si (CH 3 ) 2 Cl 2 ) and chloromethyldimethylsilane (SiH (CH 3 ) 2 (CH 2 Cl))

• Published in: Rapid communications in mass spectrometry 2021-07, Vol.35 (14), p.e9114
• Main Authors: Michalczuk, B, Barszczewska, W
• Format: Article
• Language: English
• ISSN: 0951-4198; 1097-0231
• DOI: 10.1002/rcm.9114

Silane derivatives are widely used in industrial plasmas for manufacturing lighting devices, solar cells, displays, etc. Models of technological plasmas require quantitative data. The rate coefficients (k) and the activation energies (E ) of thermal electron attachment for Si (CH ) Cl, Si (CH ) Cl and SiH (CH ) (CH Cl) are reported. This is important to understand the basic processes occurring in plasmas. Pulsed Townsend technique (known as the electron swarm method) has been applied for the measurements. In this technique, electrons generated by the laser, under a uniform electric field, traverse to the anode and induce a charge on it. In the buffer gas charge grows linearly, but in the presence of the scavenger, electrons are captured, thus the rate of charge increase slows down with time. From the shape of the pulse, the kinetic parameters are determined. Kinetic parameters from the study of thermal electron attachment by chlorotrimethylsilane, dichlorodimethylsilane, and chloromethyldimethylsilane were determined for the first time. The corresponding rate coefficients at 298 K are equal to (9.56±0.02)x10 cm s , (6.62±0.02)x10 cm s , (1.24±0.05)x10 cm s and E values are equal to 0.29±0.01eV, 0.24±0.01eV and 0.31±0.01eV for Si (CH ) Cl, Si (CH ) Cl and SiH (CH ) (CH Cl) respectively. The experiment was performed in the 298K-378K temperature range. The presented results provide important new information about fundamental quantities such as rate coefficients and activation energies for thermal electron capture by chlorinated derivatives of silane. These data can further advance our understanding of thermal electron interactions with chlorosilanes that can be used to control the important species in the plasmas of many modern technologies.