Status monitoring of ion sputter relevant parameters of an XPS depth profiling instrument

An X‐ray photoelectron spectroscopy (XPS) instrument is utilized for sputter depth profiling of thin films. Relevant instrumental parameters are the ion gun sputter rate, the contamination level of the sputter ion gun, and the purity of the sputter ion gun gas supply as well as the vacuum quality of...

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Bibliographic Details
Published in:Surface and interface analysis 2020-12, Vol.52 (12), p.943-947
Main Author: Scheithauer, Uwe
Format: Article
Language:English
Subjects:
Contamination
Depth profiling
ESCA
Gases
Ions
Parameters
Photoelectrons
Purity
Residual gas
Silicon dioxide
sputter depth profiling
sputter gas purity
sputter rate
Thickness
Thin films
vacuum quality monitoring
XPS
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