Use of spatial emission profiles and a nomenclature system as aids in interpreting matrix effects in the low-power argon inductively coupled plasma

• Published in: Spectrochimica acta. Part B: Atomic spectroscopy 1981, Vol.36 (1), p.49-59
• Main Authors: Koirtyohann, S.R., Stephen Jones, J., Jester, Colleen P., Yates, Dennis A.
• Format: Article
• Language: English
• ISSN: 0584-8547; 1873-3565
• DOI: 10.1016/0584-8547(81)80007-9

An automated profiling system was used to determine vertical intensity distributions for atomic and ionic lines of several elements in the ICP and to measure the effect of matrix components on those distributions. Most atomic lines show maximum signal (not necessarily maximum signal/noise) rather low in the plasma. Ion lines predominate in the plasma region used most frequently for analysis. In the region of high atomic emission, enhancements are observed for both atom and ion lines with many analytes when matrix elements are added. The enhancements either disappear or become much less severe in the region of high ionic emission normally viewed. The zone where the interferences occur can be shifted higher or lower in the plasma depending primarily on the central gas flow and the power level. Plasma structure can be used to predict regions of high interference. A Nomenclature System for the plasma zone is used as an aid in comparing plasma conditions.