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Voltammetric response of a copper(II) complex incorporated in silica-modified carbon-paste electrode
This work describes the preparation, characterization and use of the complex formed by Cu(II) with 3-aminopropyltriethoxysilane immobilized on silica gel, incorporated into a carbon-paste electrode. The electrochemical studies were carried out in deaerated, 0.1 mol l −1 KCl solution through cyclic v...
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Published in: | Analytica chimica acta 1999-04, Vol.385 (1), p.103-109 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | This work describes the preparation, characterization and use of the complex formed by Cu(II) with 3-aminopropyltriethoxysilane immobilized on silica gel, incorporated into a carbon-paste electrode. The electrochemical studies were carried out in deaerated, 0.1
mol
l
−1 KCl solution through cyclic voltammetry by scanning the potential from +1.0 to −1.0
V. Two redox processes were observed that could be assigned to Cu(II)/Cu(I). The formal standard potentials,
E
0′ (where
E
0′=(
E
pa+
E
pc)/2;
E
pa the anodic and
E
pc the cathodic peak potentials), of the first and second redox couples were calculated, giving 94 and −274
mV vs. Ag/AgCl, respectively. The dependence of peak potential on the sweeping rate, indicated a
quasi-reversible behavior. From the plot of
I
p vs.
v
1/2 (
I
p is the peak current and
v the scan rate), a straight line was obtained at low scan rates ( |
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ISSN: | 0003-2670 1873-4324 |
DOI: | 10.1016/S0003-2670(98)00773-9 |