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Experimental comparison of N(1s) X-ray photoelectron spectroscopy binding energies of hard and elastic amorphous carbon nitride films with reference organic compounds
In this work, hard and elastic amorphous carbon nitride (a-CN x ) films were deposited by DC magnetron sputtering on heated Si(001) substrates at 400 °C. Nanoindentation results confirmed that the films were highly compliant and had high elastic recovery. X-ray photoelectron spectroscopy (XPS) was u...
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Published in: | Carbon (New York) 2003, Vol.41 (10), p.1917-1923 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | In this work, hard and elastic amorphous carbon nitride (a-CN
x
) films were deposited by DC magnetron sputtering on heated Si(001) substrates at 400
°C. Nanoindentation results confirmed that the films were highly compliant and had high elastic recovery. X-ray photoelectron spectroscopy (XPS) was used to investigate nitrogen bonding by directly comparing the N(1s) spectra of a-CN
x
with the N(1s) peak positions of a variety of organic compounds that were characterized in the same XPS system. The N(1s) XPS spectra of hard and elastic a-CN
x
is resolved into two dominant intensity contributions at 398.5 and 400.6 eV. We show that the N(1s) spectra of a-CN
x
do not conclusively support a film-structure model with nitrogens bonded to sp
3 carbons. We offer an alternate interpretation based on the presented data and previous XPS, nuclear magnetic resonance (NMR), and computational work. Together, the data suggest that hard and elastic a-CN
x
consists of an sp
2 carbon network and that single-atom vacancy defects, as found in a graphite layer, may be present in the material. This implies that the low binding energy N(1s) component at 398.5 eV may be due to pyridine-like nitrogen bonded at the perimeter of a vacancy defect. |
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ISSN: | 0008-6223 1873-3891 |
DOI: | 10.1016/S0008-6223(03)00170-2 |