Quantum chemical modeling for 157 nm photolithography

In its continuing quest for smaller length scales, the electronics industry plans to introduce 157 nm as the next lithographic wavelength. Accordingly, there is a pressing need to develop photoresists that are more transparent, and pellicles that are both more transparent and more durable. With the...

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Bibliographic Details
Published in:Journal of fluorine chemistry 2003-07, Vol.122 (1), p.37-46
Main Authors: Waterland, Robert L, Dobbs, Kerwin D, Rinehart, Amy M, Feiring, Andrew E, Wheland, Robert C, Smart, Bruce E
Format: Article
Language:English
Subjects:
157 nm
Fluorohexane
Photoresist
Quantum chemistry
TD-DFT
Vacuum ultraviolet
VUV
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Summary:In its continuing quest for smaller length scales, the electronics industry plans to introduce 157 nm as the next lithographic wavelength. Accordingly, there is a pressing need to develop photoresists that are more transparent, and pellicles that are both more transparent and more durable. With the advent and popularization of time-dependent density functional theory (TD-DFT), we now have a practical quantum chemical method for calculating excitation energies and transition moments in the vacuum ultraviolet (VUV) which can greatly assist in the scouting of highly transparent materials. We have performed TD-DFT calculations for a broad variety of fluorinated molecules and we will report calculated VUV photoabsorption spectra for a large family of model fluorohexanes. These calculations, which span a range from 1-fluorohexane to CH 3CF 2CF 2CF 2CF 2CH 3, illustrate some of the principles one may use to design low absorption polymeric materials.
ISSN:0022-1139
1873-3328
DOI:10.1016/S0022-1139(03)00078-2