The Influence of pH and Chlorides on Electrochemical Behavior of Copper in the Presence of Benzotriazole

The influence of benzotriazole on electrochemical behavior of copper in borax buffer solutions, in pH range 8.0-12.3, with or without 0.05 M NaCl chlorides, was studied. Two methods were used in order to examine the effect of BTA: a) the Cu electrode was immersed for various time periods (5, 15 and...

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Bibliographic Details
Published in:International journal of electrochemical science 2009-07, Vol.4 (7), p.962-979
Main Authors: Antonijevic, M.M., Milic, S.M., Dimitrijevic, M.D., Petrovic, M.B., Radovanovic, M.B., Stamenkovic, A.T.
Format: Article
Language:English
Subjects:
benzotriazole
borax buffers
chloride ions
copper
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Summary:The influence of benzotriazole on electrochemical behavior of copper in borax buffer solutions, in pH range 8.0-12.3, with or without 0.05 M NaCl chlorides, was studied. Two methods were used in order to examine the effect of BTA: a) the Cu electrode was immersed for various time periods (5, 15 and 60 min) in 0.2 % BTA solution, before the polarization conducted in borax buffers and b) various concentrations of BTA (6.72·10-4 M, 6.72·10-5 M and 3.36·10-5 M) were added to borax buffers before measurements. In both cases, BTA was found to manifest significant protective properties, but better effect was accomplished by pretreatment. The adsorption of BTA on the copper surface obays the Langmuir’s adsorption isotherm.
ISSN:1452-3981
1452-3981
DOI:10.1016/S1452-3981(23)15199-6