The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films

• Published in: Applied surface science 2018-05, Vol.440, p.1211-1218
• Main Authors: Kim, Jae-Ho, Seong, Tae-Yeon, Ahn, Kyung-Jun, Chung, Kwun-Bum, Seok, Hae-Jun, Seo, Hyeong-Jin, Kim, Han-Ki
• Format: Article
• Language: English
• Subjects: Cylindrical rotating magnetron sputtering; Preferred orientation; Sn-doped In2O3; Thickness; Transparent conducting electrodes
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/j.apsusc.2018.01.318

[Display omitted] •Electrical and optical properties of ITO films grown via cylindrical rotating magnetron sputtering.•Thickness effect of ITO films on their resistivity and optical transmittance.•Preferred orientation of ITO film with increasing film thickness. We report the characteristics of Sn-doped In2O3 (ITO) films intended for use as transparent conducting electrodes; the films were prepared via a five-generation, in-line type, cylindrical, rotating magnetron sputtering (CRMS) system as a function of film thickness. By using a rotating cylindrical ITO target with high usage (∼80%), we prepared high conductivity, transparent ITO films on five-generation size glass. The effects of film thickness on the electrical, optical, morphological, and structural properties of CRMS-grown ITO films are investigated in detail to correlate the thickness and performance of ITO films. The preferred orientation changed from the (2 2 2) to the (4 0 0) plane with increasing thickness of ITO is attributed to the stability of the (4 0 0) plane against resputtering during the CRMS process. Based on X-ray diffraction, surface field emission scanning electron microscopy, and cross-sectional transmission electron microscopy, we suggest a possible mechanism to explain the preferred orientation and effects of film thickness on the performance of CRMS-grown ITO films.