Coarse-grained molecular dynamics simulations of particle behaviors in magnetorheological polishing fluid

• Published in: Computational materials science 2019-06, Vol.163, p.68-81
• Main Authors: Xu, Jinhuan, Li, Jianyong, Zhu, Pengzhe, Li, Baozhen, Zhao, Chaoyue
• Format: Article
• Language: English
• Subjects: Abrasive particle; Mesoscopic; Molecular dynamics simulation; Polishing
• ISSN: 0927-0256; 1879-0801
• DOI: 10.1016/j.commatsci.2019.03.023

[Display omitted] •A biphasic CGMD model with magnetic and abrasive particles is built for MRPFs.•Higher magnetic field gradient leads to higher active abrasive particle ratio.•Effects of magnetic field intensity on particle behaviors in MRPFs are discussed.•Higher abrasive particle fraction results in lower active abrasive particle ratio. Material removal in magnetorheological polishing (MRP) process is primarily caused by abrasive particles. To analyze the particle behaviors in MRP fluids, a biphasic coarse-grained molecular dynamics model including magnetic dipoles and abrasive particles is built. The effects of magnetic field gradient, magnetic strength and abrasive particle concentration are studied both from theoretical analysis and numerical simulation. The results show that the increased magnetic field gradient and intensity increase the probability that abrasive particles contact the workpiece significantly, while increased abrasive particle concentration reduces the probability. Moreover, increased magnetic field gradient and abrasive particle concentration greatly increase the response time of MRP fluid system undesirably, but the increased magnetic field intensity leads to a firstly increased but then dropped response time.