Investigation of homoepitaxial growth by microwave plasma CVD providing high growth rate and high quality of diamond simultaneously

• Published in: Materials today communications 2020-03, Vol.22, p.100816, Article 100816
• Main Authors: Vikharev, A.L., Lobaev, M.A., Gorbachev, A.M., Radishev, D.B., Isaev, V.A., Bogdanov, S.A.
• Format: Article
• Language: English
• Subjects: Crystal quality; Homoepitaxial growth; Microwave plasma CVD; Single crystal diamond; Substrate holder
• ISSN: 2352-4928; 2352-4928
• DOI: 10.1016/j.mtcomm.2019.100816

[Display omitted] •Microwave plasma CVD regime of SCD growth providing high growth rate and high quality of diamond simultaneously at minimum amount of nitrogen (less than 200 ppb) in the reactor.•Growth of high quality (100)-oriented SCD with growth rate of 6−8 μm/h at the microwave power of 3 kW and the temperature of 900 °C.•Growth of the high quality SCDs of 1 mm thickness by choosing the misorientation angle, CH4/H2 ratio and the power density or the concentration of atomic hydrogen. Single crystal diamond (SCD) growth on (100)-oriented high-pressure high-temperature (HPHT) type 2a diamond substrate was investigated to optimize growth conditions providing high growth rate and high quality of diamond simultaneously. CVD operating regime for SCD synthesis was determined which allows achieving the highest possible growth rate and at the same time the minimum number of defects in diamond at minimum amount of nitrogen (less than 200 pbb) in the reactor. At the optimized microwave plasma CVD growth condition at high power density the formation of non-epitaxial diamond crystallites or hillocks or polycrystalline diamond rim around the SCD top surface was prevented. The high power density was achieved with a relatively low gas pressure of 160 Torr due to local electric field amplification above the substrate holder with projection. High quality SCD grown with a relatively high growth rate in the range of 6−8 μm/h at a microwave power of 3 kW and a temperature of 900 °C was obtained. It was found that the formation of surface defects could be effectively suppressed by choosing the misorientation angle of the substrate surface. At this angle the step-flow growth regime was implemented. By choosing the misorientation angle, CH4/H2 ratio and the power density or the concentration of atomic hydrogen the high quality SCDs of 1 mm thickness were successfully grown.