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Performance improvement of bilayer memristor based on hafnium oxide by Ti/W synergy and its synaptic behavior
Bilayer and multi-layer structures can effectively improve the performance of memristors, but the oxide/metal interface during the resistance switching process affects its reliability and stability. In this work, the Pt/HfO2/HfOx/W and Pt/HfO2/HfOx/Ti/W memristors with a homogeneous bilayer structur...
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Published in: | Vacuum 2024-09, Vol.227, p.113392, Article 113392 |
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Main Authors: | , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | Bilayer and multi-layer structures can effectively improve the performance of memristors, but the oxide/metal interface during the resistance switching process affects its reliability and stability. In this work, the Pt/HfO2/HfOx/W and Pt/HfO2/HfOx/Ti/W memristors with a homogeneous bilayer structure are compared to systematically investigate the effect of interface engineering on bilayer hafnium oxide devices by inserting Ti buffer layer to construct Ti/W composite electrode. Compared with the stimulated oxidation of the W electrode, the device under the synergy of Ti/W composite electrode showed better switching uniformity (The resistance of the high-resistance state and reset voltage variation coefficient decreased from 83.1 % to 31.9 % and from 9.5 % to 5.6 %, respectively.) and robust endurance (>104 cycles). Meanwhile, some essential synaptic behaviors such as nonlinear transmission characteristics, paired-pulse facilitation, and spike-timing-dependent plasticity were mimicked by using different pulse stimuli. Subsequently, the resistance switching mechanism of the device under the Ti/W synergy was explored by combining the results of I–V curve fitting and material analysis. These results provided important experimental guidance and a theoretical basis for further optimization of electrode interfacial effect in the future.
•Interface engineering based on the Ti buffer layer improves the stability of bilayer hafnium oxide memristor.•Ti and W participate in the oxygen exchange of the memristor switching process to realize Ti/W synergy.•Some essential synaptic behaviors of Pt/HfO2/HfOx/Ti/W device are mimicked by using different pulse stimuli.•The Ti/W synergistic effect model is proposed to elaborate the formation/rupture of the device's conductive filaments. |
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ISSN: | 0042-207X 1879-2715 |
DOI: | 10.1016/j.vacuum.2024.113392 |