Nanofabrication of Self-Assembled Monolayers Using Scanning Probe Lithography

This Account focuses on our recent and systematic effort in the development of generic scanning probe lithography (SPL)-based methodologies to produce nanopatterns of self-assembled monolayers (SAMs). The key to achieving high spatial precision is to keep the tip−surface interactions strong and loca...

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Bibliographic Details
Published in:Accounts of chemical research 2000-07, Vol.33 (7), p.457-466
Main Authors: Liu, Gang-Yu, Xu, Song, Qian, Yile
Format: Article
Language:English
Subjects:
Chemistry - methods
Electrons
Forecasting
Microscopy, Atomic Force - methods
Microscopy, Scanning Tunneling
Proteins - chemistry
Surface Properties
Threshold Limit Values
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Summary:This Account focuses on our recent and systematic effort in the development of generic scanning probe lithography (SPL)-based methodologies to produce nanopatterns of self-assembled monolayers (SAMs). The key to achieving high spatial precision is to keep the tip−surface interactions strong and local. The approaches used include two AFM-based methods, nanoshaving and nanografting, which rely on the local force, and two STM-based techniques, electron-induced diffusion and desorption, which use tunneling electrons for fabrication. In this Account we discuss the principle of these procedures and the critical steps in controlling local tip−surface interactions. The advantages of SPL will be illustrated through various examples of production and modification of SAM nanopatterns and their potential applications.
ISSN:0001-4842
1520-4898
DOI:10.1021/ar980081s