Edge Transfer Lithography of Molecular and Nanoparticle Materials

A simple and general method which we call edge transfer lithography has been developed for large-area patterning of molecular and nanoparticle materials with line widths as small as 60 nm. The procedure employs standard “ink” and “stamp” microcontact printing techniques and takes advantage of the in...

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Bibliographic Details
Published in:Langmuir 2002-09, Vol.18 (18), p.7029-7034
Main Authors: Cherniavskaya, Oksana, Adzic, Aleksandar, Knutson, Carl, Gross, Benjamin J, Zang, Ling, Liu, Ruchuan, Adams, David M
Format: Article
Language:English
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Summary:A simple and general method which we call edge transfer lithography has been developed for large-area patterning of molecular and nanoparticle materials with line widths as small as 60 nm. The procedure employs standard “ink” and “stamp” microcontact printing techniques and takes advantage of the intrinsic topographic character of micropatterned elastomeric stamps and discontinuous dewetting behavior of ink solutions to selectively apply ink within the recesses of the stamp. In this way, molecules or particles are delivered from the stamp to a solid substrate of interest selectively along the edges of the stamp features. Siloxane self-assembled monolayers (SAMs) and titanium dioxide (TiO2) nanoparticle materials are directly patterned on glass substrates at nanometer resolution. Alkyl siloxane patterned SAM surfaces are used as a template structure for the guided self-assembly of molecular and nanoparticle materials. The surfaces are characterized by lateral force microscopy and noncontact atomic force microscopy.
ISSN:0743-7463
1520-5827
DOI:10.1021/la0114575