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Solution-processed indium-free ZnO/SnO 2 bilayer heterostructures as a low-temperature route to high-performance metal oxide thin-film transistors with excellent stabilities

The realization of high performance solution-processable metal oxide thin-film transistors (TFTs) with low annealing temperatures remains a challenge in the field of flexible and/or transparent electronics. Indium-based metal oxides are one of the most widely used materials as channel layers of meta...

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Bibliographic Details
Published in:Journal of materials chemistry. C, Materials for optical and electronic devices Materials for optical and electronic devices, 2016, Vol.4 (47), p.11298-11304
Main Authors: Nam, Sooji, Yang, Jong-Heon, Cho, Sung Haeng, Choi, Ji Hun, Kwon, Oh-Sang, Park, Eun-Suk, Lee, Su-Jae, Cho, Kyoung-Ik, Jang, Jaeyoung, Hwang, Chi-Sun
Format: Article
Language:English
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Summary:The realization of high performance solution-processable metal oxide thin-film transistors (TFTs) with low annealing temperatures remains a challenge in the field of flexible and/or transparent electronics. Indium-based metal oxides are one of the most widely used materials as channel layers of metal oxide TFTs. However, the need for developing indium-free metal oxide materials has become urgent because of the high cost and limited supply of indium. Herein, we report high-performance solution-processed indium-free metal oxide TFTs prepared with low annealing temperatures by introducing ZnO/SnO 2 bilayer heterostructures. After photo- and thermal annealing, ZnO/SnO 2 bilayers form a unique nanostructure composed of three zones: Zn-only, Zn–Sn-mixed, and Sn-rich zones. The resulting ZnO/SnO 2 TFTs exhibit outstanding mobility values as high as 15.4 cm 2 V −1 s −1 with a low annealing temperature of 300 °C. These values are the highest yet measured among indium-free and solution-processed metal oxide TFTs prepared under similar annealing conditions. The ZnO/SnO 2 TFTs also show remarkable outstanding operational stabilities under various external bias stresses. Their high performances and excellent stabilities can be attributed to the combinational effects of the highly conductive ultrathin Sn-rich channel and balanced carrier concentrations in the Zn–Sn-mixed region. We believe that our work provides a facile route to prepare inexpensive solution-processed electronic devices with earth-abundant materials such as backplane circuits for large-area and flexible displays.
ISSN:2050-7526
2050-7534
DOI:10.1039/C6TC03977D