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Bifunctional nickel and copper electrocatalysts for CO 2 reduction and the oxygen evolution reaction
In this study, a bifunctional electrocatalyst for CO 2 reduction and the O 2 evolution reaction (OER) was constructed from the electrodeposition of cuprous oxide (Cu 2 O) and Ni on a carbon substrate. Different Ni thicknesses on Cu 2 O were achieved by varying the time of chronopotentiometric deposi...
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Published in: | Journal of materials chemistry. A, Materials for energy and sustainability Materials for energy and sustainability, 2020-01, Vol.8 (4), p.1741-1748 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | In this study, a bifunctional electrocatalyst for CO
2
reduction and the O
2
evolution reaction (OER) was constructed from the electrodeposition of cuprous oxide (Cu
2
O) and Ni on a carbon substrate. Different Ni thicknesses on Cu
2
O were achieved by varying the time of chronopotentiometric deposition of Ni. Electrochemical CO
2
reduction was carried out at −0.89 V and −1.89 V
vs.
RHE, and it was found that formate and CO were the two major products. Cu
2
O modified with a Ni overlayer with a thickness of ∼700 nm resulted in the highest formate faradaic efficiency of 18%, and Cu
2
O resulted in highest CO faradaic efficiency of 7.9%. The enhanced faradaic efficiency for formate is attributed to the synergistic effect between Ni and Cu
2
O due to maximized amounts of exposed bimetallic sites that facilitate CO
2
reduction. The electrocatalyst also produces ∼9 times more current density than previous studies using Ni–Cu
2
O electrocatalysts for the OER. The ability of the Ni–Cu
2
O thin films to catalyze both the OER and CO
2
reduction allows them to be incorporated in the first demonstration of a two-electrode CO
2
conversion device with a bifunctional catalyst. In this architecture, the device produces formate and CO with faradaic efficiencies of 16.0% and 19.7%, respectively. |
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ISSN: | 2050-7488 2050-7496 |
DOI: | 10.1039/C9TA12055F |