Formation of an ordered pattern of Bi nanolines on InAs(100)by self-assembly

Self-assembly of uniform patterns of nanolines over large surface areas has been proven to be difficult. The authors report that bismuth (Bi) adsorbate self-assembles into an ordered pattern of Bi nanolines separated by 4.3 nm on the Bi-stabilized In As ( 100 ) ( 2 × 1 ) . The resulted nanoline surf...

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Bibliographic Details
Published in:Applied physics letters 2008-01, Vol.92 (1), p.011926-011926-3
Main Authors: Ahola-Tuomi, M., Laukkanen, P., Punkkinen, M. P. J., Perälä, R. E., Väyrynen, I. J., Kuzmin, M., Schulte, K., Pessa, M.
Format: Article
Language:English
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Summary:Self-assembly of uniform patterns of nanolines over large surface areas has been proven to be difficult. The authors report that bismuth (Bi) adsorbate self-assembles into an ordered pattern of Bi nanolines separated by 4.3 nm on the Bi-stabilized In As ( 100 ) ( 2 × 1 ) . The resulted nanoline surface is studied by scanning tunneling microscopy (STM) and low-energy electron diffraction. The plausible atomic models for the Bi nanolines are proposed on the basis of the STM results. The Bi lines are suggested to consist of two chains of adjacent Bi dimers positioned parallel to the chain and parallel to the Bi dimers of the ( 2 × 1 ) substrate.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2831691