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Probing channel temperature profiles in Al x Ga 1−x N/GaN high electron mobility transistors on 200 mm diameter Si(111) by optical spectroscopy
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Published in: | Applied physics letters 2014-08, Vol.105 (7), p.73504 |
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Main Authors: | , , , , , , , , , |
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Language: | English |
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container_issue | 7 |
container_start_page | 73504 |
container_title | Applied physics letters |
container_volume | 105 |
creator | Kyaw, L. M. Bera, L. K. Liu, Y. Bera, M. K. Singh, S. P. Dolmanan, S. B. Tan, H. R. Bhat, T. N. Chor, E. F. Tripathy, S. |
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doi_str_mv | 10.1063/1.4893603 |
format | article |
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source | American Institute of Physics (AIP) Publications; American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list) |
title | Probing channel temperature profiles in Al x Ga 1−x N/GaN high electron mobility transistors on 200 mm diameter Si(111) by optical spectroscopy |
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