The influence of hydrogen plasma etching on the surface conductivity of the polycrystalline diamond surface and the temperature-dependent properties

• Published in: AIP advances 2023-06, Vol.13 (6)
• Main Authors: Jia, Zhenglin, Yang, Mingyang, Qiu, Mengting, Zhang, Bingxue, Nishimura, Kazuhito, Lin, Cheng-Te, Jiang, Nan, Yuan, Qilong
• Format: Article
• Language: English
• Subjects: Carrier density; Grain boundaries; Hall effect; Hydrogen plasma; Plasma etching; Polycrystalline diamond; Polycrystals; Scattering; Surface roughness; Temperature dependence
• ISSN: 2158-3226; 2158-3226
• DOI: 10.1063/5.0153718

With the development of carbon-based electronics, the polycrystalline diamond has drawn much attention in diamond electronic devices; as compared to single crystalline diamond, the scale of the polycrystalline diamond can be fabricated over 4 in. much more easily. However, until now, the influence factors on the surface conductivity of hydrogen-terminated polycrystalline diamond (H-PCD) are still unclear. In this work, the carrier concentration and mobility of H-PCD were investigated through Hall effect measurement. It was found that besides surface roughness, the temperature at which the equilibrium states of adsorption and desorption of H-PCD surface adsorbates are established also plays an important role in carrier concentration and mobility. With the increase of the establishment temperature, both carrier concentration and mobility show a decreasing tendency, which may be determined by the coefficient of the surface ionic scattering, phonon scattering, and the grain boundaries on the H-PCD surface. The investigation of this work will give some insight into the control of the surface conductivity on H-PCD from the aspect of the equilibrium state established temperature and surface roughness.