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Defect concentration and Δn change in light- and elevated temperature-induced degradation
The wide variety of silicon materials used by various groups to investigate LeTID make it difficult to directly compare the defect concentrations ( N t ) using the typical normalised defect density (NDD) metric. Here, we propose a new formulation for a relative defect concentration ( β ) as a correc...
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Published in: | Journal of physics. D, Applied physics Applied physics, 2022-02, Vol.55 (8), p.85106 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The wide variety of silicon materials used by various groups to investigate LeTID make it difficult to directly compare the defect concentrations (
N
t
) using the typical normalised defect density (NDD) metric. Here, we propose a new formulation for a relative defect concentration (
β
) as a correction for NDD that allows flexibility to perform lifetime analysis at arbitrary injection levels (Δ
n
), away from the required ratio between Δ
n
and the background doping density (
N
dop
) for NDD of Δ
n/N
dop
= 0.1. As such,
β
allows for a meaningful comparison of the maximum degradation extent between different samples in different studies and also gives a more accurate representative value to estimate the defect concentration. It also allows an extraction at the cross-over point in the undesirable presence of iron or flexibility to reduce the impact of modulation in surface passivation. Although the accurate determination of
β
at a given Δ
n
requires knowledge of the capture cross-section ratio (
k
), the injection-independent property of the
β
formulation allows a self-consistent determination of
k
. Experimental verification is also demonstrated for boron-oxygen related defects and LeTID defects, yielding
k
-values of 10.6 ± 3.2 and 30.7 ± 4.0, respectively, which are within the ranges reported in the literature. With this, when extracting the defect density at different Δ
n
ranging between 10
14
cm
−3
to 10
15
cm
−3
with
N
dop
= 9.1 × 10
15
cm
−3
, the error is less than 12% using
β
, allowing for a greatly improved understanding of the defect concentration in a material. |
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ISSN: | 0022-3727 1361-6463 |
DOI: | 10.1088/1361-6463/ac34a8 |