Study From Cryogenic to High Temperatures of the High- and Low-Resistance-State Currents of ReRAM Ni–HfO 2 –Si Capacitors

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Bibliographic Details
Published in:IEEE transactions on electron devices 2016-05, Vol.63 (5), p.1877-1883
Main Authors: Vaca, Cesar, Gonzalez, Mireia B., Castan, Helena, Garcia, Hector, Duenas, Salvador, Campabadal, Francesca, Miranda, Enrique, Bailon, Luis A.
Format: Article
Language:English
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ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2016.2546898