Spatial survey of a magnetron plasma sputtering system using a Langmuir probe

• Published in: Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2002-11, Vol.20 (6), p.2032-2041
• Main Authors: Field, D. J., Dew, S. K., Burrell, R. E.
• Format: Article
• Language: English
• ISSN: 0734-2101; 1520-8559
• DOI: 10.1116/1.1515800

A two-dimensional spatial survey is conducted for a magnetron sputtering plasma at two pressures (40 and 5 mTorr) using a Langmuir probe. The plasma density is found to be highest (up to 6.0×10 10   cm −3 ) above the etch region of the cathode, near the magnetic trap. The density drops between the etch regions, near the edges of the cathode and also at distances farther away from the cathode. The floating potential was found to be most negative (down to −12 V) in regions where the highest electron temperatures were observed (up to almost 4 eV) and became less negative (near 0 V) in regions where the electron temperature was lowest (less than 0.5 eV). This complementary trend was consistent in all spatial locations and at both pressures. The plasma potential was found to have very weak dependence, if any, on spatial location and pressure. The relationship between electron transport processes, collision processes and electron temperatures is discussed. Electron energy distribution functions were found to be either Maxwellian or bi-Maxwellian in nature, depending on pressure and spatial location. Maxwellian distributions were found near the magnetic trap or source of the plasma. Bi-Maxwellian distributions were found further away from the source, and it appears they result from Maxwellian distributions bifurcating as they diffuse away from the source. The suitability of the popular models for this bifurcation is discussed.