S i O 2 / P o l y - S i Multilayered Electron Beam Resist Process for Fabrication of Ultrasmall Tunnel Junctions

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Published in:Japanese Journal of Applied Physics 1995-12, Vol.34 (Part 1, No. 12B), p.6961-6965
Main Authors: Wada, Toshimi, Hirayama, Motoki, Haraichi, Satoshi, Ishii, Ken'ichi, Hiroshima, Hiroshi, Komuro, Masanori
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Language:English
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container_end_page 6965
container_issue Part 1, No. 12B
container_start_page 6961
container_title Japanese Journal of Applied Physics
container_volume 34
creator Wada, Toshimi
Hirayama, Motoki
Haraichi, Satoshi
Ishii, Ken'ichi
Hiroshima, Hiroshi
Komuro, Masanori
description
doi_str_mv 10.1143/JJAP.34.6961
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source Institute of Physics IOPscience extra; Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)
title S i O 2 / P o l y - S i Multilayered Electron Beam Resist Process for Fabrication of Ultrasmall Tunnel Junctions
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