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Low Pressure Deposition of Silicon Nitride by SiCl4 and NH 3 Reaction

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Bibliographic Details
Published in:	Journal of the Electrochemical Society 1981-03, Vol.128 (3), p.708-709
Main Authors:	Szendro, I., Marton, E.
Format:	Article
Language:	English
Citations:	Items that cite this one
Online Access:	Get full text
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