Computational Fluid Dynamics simulation of the ALD of alumina from TMA and H2O in a commercial reactor

[Display omitted] •A CFD model is built for a commercial ALD reactor depositing alumina from TMA-H2O.•Results show the effect of the reactor geometry on the flow field above the substrate.•The model predicts a temperature gradient along the substrate surface.•A non-uniform species distribution on th...

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Bibliographic Details
Published in:Chemical engineering research & design 2018-04, Vol.132, p.795-811
Main Authors: Gakis, G.P., Vergnes, H., Scheid, E., Vahlas, C., Caussat, B., Boudouvis, A.G.
Format: Article
Language:English
Subjects:
ALD
Alumina
CFD
Chemical engineering
Chemical Sciences
Engineering Sciences
Film uniformity
Fluids mechanics
Mechanics
TMA
Water
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Summary:[Display omitted] •A CFD model is built for a commercial ALD reactor depositing alumina from TMA-H2O.•Results show the effect of the reactor geometry on the flow field above the substrate.•The model predicts a temperature gradient along the substrate surface.•A non-uniform species distribution on the wafer surface exists during the TMA pulse.•The loading door Ar flow causes non-uniform species profile during the H2O pulse. A three-dimensional Computational Fluid Dynamics model is built for a commercial Atomic Layer Deposition (ALD) reactor, designed to treat large area 20cm substrates. The model aims to investigate the effect of the reactor geometry and process parameters on the gas flow and temperature fields, and on the species distribution on the heated substrate surface, for the deposition of Al2O3 films from trimethyl aluminum and H2O. The investigation is performed in transient conditions, without considering any surface reaction. A second CFD model is developed for the feeding system of the reactor, in order to calculate the unknown reactant inlet flow rates. The two models are coupled via a computational strategy dictated by the available experimental measurements. Results show that a purging flow entering the reactor through its loading door affects the flow field above the substrate surface and causes non-uniformity in the temperature and reactants concentration on the substrate surface. During the TMA pulse, a recirculation sets in above the substrate surface, leading to a non-uniform distribution of species on the surface.
ISSN:0263-8762
1744-3563
DOI:10.1016/j.cherd.2018.02.031