Nanometer-scale Lithography Of The Ultrathin Films With Atomic Force Microscopy

• Main Authors: Jinchul Kim, Haiwon Lee, Yongwoo Shin, Sunwoo Park
• Format: Conference Proceeding
• Language: English
• Subjects: Atomic force microscopy; Chemical engineering; Chemical processes; Lithography; Organic chemicals; Resists; Substrates; Surface resistance; Thermal force; Voltage
• DOI: 10.1109/IMNC.1998.730025

Atomic force microscope (AFM) and scanning tunneling microscope (STM), as a branch of scanning probe microscope (SPM), have been taken a great deal of attention in recent years for acquiring the nanometer-scale patterns. In order to apply SPM more generally to nano-device fabrication, SPM-based nanolithographic processes must be developed Determining the optimum resist material is a key factor in the successful application of scanning probe lithography (SPL)1,2 Resist films must be prepared in a thin and uniform layer in order to attain high spatial resolution in nanometer-scale Self-assembled monolayers (SAMs)' consisting of organosilane molecules show great potential as ultrathin resist films These are organic molecules that spontaneously chemically bind to certain materials to form ordered monolayers In addition to forming a highly ordered layer, these films have been shown to be chemically resistant to many common acids and solvents and to be stable at moderately high temperatures Compared to LB films, SAMs are more thermally and chemically stable because of their chemical bond to the substrate However, a disadvantage of the SAMs technique IS the necessity of having the proper functional group in the organic molecule in order to bond to a given substrate AFM lithography was carried out using the octadecyldimethylmethoxysilane (ODMS) monolayer