Pulsed-DC Discharge for Plasma CVD of Carbon Thin Films

A pulsed-dc discharge method for plasma chemical vapor deposition (CVD) was developed using a constructed versatile pulsed-dc generator and a vacuum discharge chamber. Argon (Ar) gas discharge experiments were performed under a variety of discharge conditions, and plasma conditions were evaluated us...

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Bibliographic Details
Published in:IEEE Transactions on Plasma Science 2019-01, Vol.47 (1), p.22-31
Main Authors: Mamun, Md Abdullah Al, Furuta, Hiroshi, Hatta, Akimitsu
Format: Article
Language:eng ; jpn
Subjects:
Acetylene
Capacitively coupled plasma (CCP)
Capacitors
Carbon
Chemical vapor deposition
chemical vapor deposition (CVD)
DC generators
diamond-like carbon (DLC)
Diamond-like carbon films
Discharges (electric)
Electric potential
Electrodes
Emission analysis
Emission spectroscopy
Gas discharges
Generators
Glass substrates
Glow discharges
High voltages
high-voltage pulsed-dc generator
Optical emission spectroscopy
Organic chemistry
Plasma
Plasmas
Properties (attributes)
pulse parameters
Pulse repetition rate
pulsed-dc discharge
pyrolytic carbon (PyC)
Raman spectroscopy
Silicon substrates
Spectroscopy
Spectrum analysis
Stimulated emission
Substrates
Switches
Thin films
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