A new tool for nondestructive monitoring of ion implantation

We describe recent research designed to assess the potential of charged particle beams as an implant-monitoring tool. The technique currently under development, based on positron annihilation spectroscopy, is totally nondestructive, sensitive to implant doses as low as 10/sup 9/ cm/sup -2/, and most...

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Bibliographic Details
Main Authors: Coleman, P.G., Burrows, C.P., Knights, A.P., Gwilliam, R.M., Sealy, B.J., Goldberg, R.D., Al-Bayati, A., Foad, M., Murrell, A.
Format: Conference Proceeding
Language:English
Subjects:
Collaborative tools
Electronics industry
Implants
Instruments
Ion beams
Ion implantation
Monitoring
Particle beams
Positrons
Spectroscopy
Online Access:Request full text
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Description
Summary:We describe recent research designed to assess the potential of charged particle beams as an implant-monitoring tool. The technique currently under development, based on positron annihilation spectroscopy, is totally nondestructive, sensitive to implant doses as low as 10/sup 9/ cm/sup -2/, and most importantly, can be tuned to obtain depth-resolved information. A collaborative project between the Surrey Ion Beam Centre and researchers at the University of Bath is underway, aimed at developing a tool suitable for use in the semiconductor industry. A prototype instrument is described, together with preliminary measurements using a laboratory based instrument. Applications to other vacancy-mediated processes, and the value of the new instrument in a research and development environment is discussed.
DOI:10.1109/IIT.2000.924238