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Operational stability of solution-processed indium-oxide thin-film transistors: Environmental condition and electrical stress
We investigate the operational stability of bottom-gate/top-contact-structured indium-oxide (In 2 O 3 ) thin-film transistors (TFTs) in atmospheric air and under vacuum. Based on the thermogravimetric analysis of the In 2 O 3 precursor solution, we utilize a thermal annealing process at 400 °C for 4...
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Published in: | Journal of the Korean Physical Society 2018, 72(1), , pp.151-158 |
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Main Authors: | , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | We investigate the operational stability of bottom-gate/top-contact-structured indium-oxide (In
2
O
3
) thin-film transistors (TFTs) in atmospheric air and under vacuum. Based on the thermogravimetric analysis of the In
2
O
3
precursor solution, we utilize a thermal annealing process at 400 °C for 40 min to prepare the In
2
O
3
films. The results of X-ray photoemission spectroscopy and field-emission scanning electron microscopy show that the electron is the majority carrier in the In
2
O
3
semiconductor film prepared by a spin-coating method and that the film has a polycrystalline morphology with grain boundaries. The fabricated In
2
O
3
TFTs operate in an
n
-type enhancement mode. When constant drain and gate voltages are applied, these TFTs in atmospheric air exhibit a more acute decay in the drain currents with time compared to that observed under vacuum. In the positive gate-bias stress experiments, a decrease in the field-effect mobility and a positive shift in the threshold voltage are invariably observed both in atmospheric air and under vacuum, but such characteristic variations are also found to be more pronounced for the atmospheric-air case. These results are explained in terms of the electron-trapping phenomenon at the grain boundaries in the In
2
O
3
semiconductor, as well as the electrostatic interactions between electrons and polar water molecules. |
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ISSN: | 0374-4884 1976-8524 |
DOI: | 10.3938/jkps.72.151 |